Tribromosilane
 | |
| Names | |
|---|---|
| IUPAC name
Tribromosilane | |
| Other names
Silicobromoform; Tribromomonosilane | |
| Identifiers | |
7789-57-3  | |
| ChemSpider | 74222 |
| |
| Jmol-3D images | Image |
| PubChem | 82244 |
| |
| Properties | |
| Molecular formula |
HBr3Si |
| Molar mass | 268.81 g·mol−1 |
| Except where noted otherwise, data is given for materials in their standard state (at 25 °C (77 °F), 100 kPa) | |
| Infobox references | |
Tribromosilane is a chemical compound containing silicon, hydrogen, and bromine. At high temperatures, it decomposes to produce silicon, and is an alternative to purified trichlorosilane of ultrapure silicon in the semiconductor industry.
The Schumacher Process of silicon deposition uses tribromosilane gas to produce polysilicon, but it has a number of cost and safety advantages over the Siemens Process to make polysilicon.[1]
It may be prepared by heading crystalline silicon with gaseous hydrogen bromide at high temperature.[2] It spontaneously combusts when exposed to air.[3]
References
- ↑ The Schumacher Process
- ↑ Schumb WC, Young RC (April 1930). "A study of the reaction of hydrogen bromide with silicon". Journal of the American Chemical Society 52 (4): 1464–1469. doi:10.1021/ja01367a025.
- ↑ Schumb WC (December 1942). "The Halides and Oxyhalides of Silicon". Chemical Reviews 31 (3): 587–595. doi:10.1021/cr60100a004.