Titanium disilicide
| Names | |
|---|---|
| IUPAC name
Titanium disilicide | |
| Other names
Titanium silicide | |
| Identifiers | |
12039-83-7  | |
| |
| Jmol-3D images | Image |
| PubChem | 6336889 |
| |
| Properties | |
| TiSi2 | |
| Molar mass | 104.038 g/mol |
| Appearance | black orthorhombic crystals |
| Density | 4.02 g/cm3 |
| Melting point | 1,470 °C (2,680 °F; 1,740 K) |
| insoluble | |
| Solubility | soluble in HF |
| Related compounds | |
| Other cations |
Zirconium disilicide Hafnium disilicide |
| Except where noted otherwise, data is given for materials in their standard state (at 25 °C (77 °F), 100 kPa) | |
 verify (what is: /?) | |
| Infobox references | |
Titanium disilicide (TiSi2) is an inorganic chemical compound.
Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.
References
| ||||||||||||||||||