Hexachlorodisilane
Hexachlorodisilane | ||
---|---|---|
IUPAC name Hexachlorodisilane | ||
Other names Disilicon hexachloride | ||
Identifiers | ||
CAS number | 13465-77-5 | |
Properties | ||
Molecular formula | Si2Cl6 | |
Molar mass | 268.88 g/mol | |
Appearance | Colorless liquid | |
Melting point | −1 °C; 30 °F; 272 K | |
Boiling point | 144 °C; 291 °F; 417 K | |
Except where noted otherwise, data are given for materials in their standard state (at 25 °C (77 °F), 100 kPa) | ||
Infobox references | ||
Hexachlorodisilane is the inorganic compound with the chemical formula Si2Cl6,[1] It is a colourless liquid that fumes in moist air. It has specialty applications in as a reagent and as a volatile precursor to silicon metal.
Structure and synthesis
The molecule adopts a structure like ethane, with a single Si-Si bond of length i0.233 nm.[2]
Hexachlorodisilane is produced in the chlorination of silicon. Idealized syntheses are as follows:[3]
- Si + 2 Cl2 → SiCl4
- Si + 3 SiCl4 → 2 Si2Cl6
Reactions and uses
Hexachlorodisilane and other homolgues decompose at high temperatures to silicon and silicon tetrachloride.[4]
- 2 Si2Cl6 → Si + 3 SiCl4
This conversion is useful in making silicon-based components of use in semiconducting devices including photovoltaic cells.[1]
The compound is also useful reagent for the deoxygenation reactions, such as this general process involving a phosphine oxide:
- 2 Si2Cl6 + OPR3 → OSi2Cl6 + PR3
References
- ↑ 1.0 1.1 Simmler, W. "Silicon Compounds, Inorganic", Ullmann's Encyclopedia of Industrial Chemistry, Weinheim: Wiley-VCH. doi:10.1002/14356007.a24_001
- ↑ T.L. Cottrell, "The Strengths of Chemical Bonds," 2nd ed., Butterworths, London, 1958.
- ↑ Seo, E.S.M; Andreoli, M; Chiba, R (2003). "Silicon tetrachloride production by chlorination method using rice husk as raw material". Journal of Materials Processing Technology 141 (3): 351. doi:10.1016/S0924-0136(03)00287-5.
- ↑ Emeleus, H. J., and Muhammad Tufail. "Reaction of Hexachlorodisilane with Bases and Alkyl Halides." Journal of Inorganic and Nuclear Chemistry 29.8 (1967): 2081-084.