Hexamethyldisiloxane

Hexamethyldisiloxane
Identifiers
Abbreviations HMDSO, (TMS)2O
CAS number 107-46-0 Y
PubChem 24764
ChemSpider 23150 Y
UNII D7M4659BPU Y
EC number 203-492-7
UN number 1993
MeSH Hexamethyldisiloxane
RTECS number JM9237000
Beilstein Reference 1736258
Jmol-3D images Image 1
Properties
Molecular formula C6H18OSi2
Molar mass 162.38 g mol−1
Exact mass 162.089618264 g mol-1
Appearance Colourless liquid
Density 0.764 g cm-3
Melting point

−59 °C, 214 K, -74 °F

Boiling point

100-101 °C, 373-374 K, 212-214 °F

Refractive index (nD) 1.377
Hazards
EU classification F
R-phrases R11
S-phrases S16
Main hazards Highly flammable liquid and vapour

Causes serious eye irritation

NFPA 704
4
1
0
Flash point -1(1) °C
Related compounds
Related compounds Disiloxane

Tetramethylsilane
Dimethyl ether
Bis(trimethylsilyl)amine

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Except where noted otherwise, data are given for materials in their standard state (at 25 °C, 100 kPa)
Infobox references

Hexamethyldisiloxane is a organosilicon compound with the formula O[Si(CH3)3]2. This volatile liquid is used as a solvent and as a reagent in organic synthesis. It is prepared by the hydrolysis of trimethylsilyl chloride. The molecule is the protypical silyl ether and resembles a subunit of polydimethylsiloxane.

Uses

Hexamethyldisiloxane is mainly used as source of the trimethylsilyl functional group (-Si(CH3)3) in organic synthesis. For example, in the presence of acid catalyst, it converts alcohols and carboxylic acids into the silyl ethers and silyl esters, respectively.[1]

HMDS is used as an internal standard for calibrating chemical shift in1H NMR spectroscopy. It is more easily handled since it is less volatile than the usual standard tetramethylsilane but still displays only a singlet near 0 ppm.

HMDS has even poorer solvating power than alkanes. It is therefore sometimes employed to crystallize highly lipophilic compounds.

It is also used in liquid bandages (spray on plasters) such as cavilon spray, to protect damaged skin from irritation from other bodily fluids.

HMDSO is being studied for making low-k dielectric materials for the semi-conductor industries by PECVD (plasma-enhanced chemical vapor deposition).

References

  1. ^ Pfeifer, J. "Hexamethyldisiloxane" in Encyclopedia of Reagents for Organic Synthesis (Ed: L. Paquette) 2004, J. Wiley & Sons, New York. doi:10.1002/047084289.