| Diazonaphthoquinone | |
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2-Diazo-2H-naphthalen-1-one |
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Other names
1,2-Naphthoquinone diazide |
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| Identifiers | |
| CAS number | 879-15-2 |
| Jmol-3D images | Image 1 |
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| Properties | |
| Molecular formula | C10H6N2O |
| Molar mass | 170.17 g mol−1 |
| (verify) (what is: /?) Except where noted otherwise, data are given for materials in their standard state (at 25 °C, 100 kPa) |
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| Infobox references | |
Diazonaphthoquinone (DNQ) is a diazo derivative of naphthoquinone. Upon exposure to light, it undergoes a Wolff rearrangement to form a ketene.[1] This chemical reaction is exploited with a variety of diazonaphthoquinone derivatives in the semiconductor industry.
Diazonaphthoquinone sulfonic acid esters are commonly used as components of photoresist materials for semiconductor manufacturing.[2][3] In this application DNQs are mixed with Novolac resin, a type of phenolic polymer. The DNQ functions as a dissolution inhibitor. During the masking/patterning process, portions of the photoresist film are exposed to light while others remain unexposed. In the unexposed regions of the resist film, the DNQ acts as a dissolution inhibitor and the resist remains insoluble in the aqueous base developer. In the exposed regions, the DNQ forms a ketene, which, in turn, reacts with ambient water to form a base soluble indene carboxylic acid. The exposed regions of the photoresist film become soluble in aqueous base; thus allowing the formation of a relief image during development.