Image:Trench doubling.JPG

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[edit] Summary

The basic process for doubling trenches or holes.

Top: Photoresist is coated over the starting trench or hole pattern.
Center: Holes or trenches are exposed and etched into the underlying layer.
Bottom: Photoresist is removed, leaving the sum of the previous and new patterns.

[edit] Licensing

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File history

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	Date/Time	Dimensions	User	Comment
current	09:19, 8 March 2008	393×488 (11 KB)	Guiding light (Talk \| contribs)	(The basic process for doubling trenches or holes. Top: Photoresist is coated over the starting trench or hole pattern. Center: Holes or trenches are exposed and etched into the underlying layer. Bottom: Photoresist is removed, leaving the sum of the prev)