Patterned medium protoypes

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Patterned Medium Prototypes are prototypes that assist in the development of pattern media research. Pattern media has predefined single domains bits that may contain multiple grains which can be extended to a single grain per bit density.

Contents 1 Advantages of prototypes in Patterned Media Research 2 Methods to Develop prototypes for Pattern Media 3 Future Applications of Pattern Media through development of protoypes 4 Notes 5 References

[edit] Advantages of prototypes in Patterned Media Research

Pattern media presents the possibility of increasing data densities in storing more information compared to conventional media. Pattern media is the next step in hard drive evolution and sciencitfic applications. In patterned media recording the areal density increases 10X over the current recording technology today^[1] Since pattern media have predefine domains, as a medium it behaves as a single magnetic domain due to a strong coupling between the grains in a bit providing higher thermal stability^[2] The advantages of patterned medium are, elimination of noise in continuous medium called transition noise due to two oppositely magnetized grains during playback, and the dependence on grain size is not of focus to obtain high data densities but relying on volume and the entire magnetic element.

[edit] Methods to Develop prototypes for Pattern Media

In research, one of the processes in creating prototypes is by ion beam proximity lithography. Ion beam proximity lithography uses stencil masks to produce patterns in ion-sensitive material (resist) which is transferred on magnetic material.^[3] The stencil mask contains a thin free standing silicon nitride membrane where openings are formed. The pattern to be generated is first formed on a substrate that contains a the photoresist using electron beam lithography. Next the substrate is used to transfer the given pattern onto the nitride membrane(stencil mask) using the process of plasma etching. To create sufficient substrates is to maintain size uniformity of the openings which is transferred to the mask during the fabrication process(etching). Many factors contribute to achieve and maintain size uniformity in the mask such: pressure, temperature, energy( amount of voltage), and power when etching. To optimize the process of etching uniform patterns correctly under these parameters, the substrate can be used as a template to fabricate a stencil masks of silicone nitride through the process of ion proximity beam lithography. Then the stencil mask can then be used as a prototype to create pattern media.

[edit] Future Applications of Pattern Media through development of protoypes

Hardrives are fully incorprated in technology today where consumers and in the future will own 10 to 20 disk drives in their everyday devices such as mp3 players, GPS systems, and digital appliances^[4] The amount of information recorded on media has a grown to 100 million bits or gigabytes and sufficient space in media to store great amounts of information is needed. The development of pattern media in hardrives can create opportunities to create more storage space for data and information to be store beyond the terabit.^[5]

[edit] Notes

[edit] References

• Ross, C.A.: "Patterned magnetic recording media"p 203-235. Annual Review of Materials Science, 2001:
• Wolfe, John C., Pendharkar, Sandeep, Ruchhoeft, Paul, Sen, Sudipto, Morgan, Mark D., & Horne, W.E.: "A proximity ion beam lithography process for high density nanostructures"p 3896-3899. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996:
• Walter, C.:"Kryder's law" p32-33. Scientific American, 2005: