Megasonic cleaning

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Megasonic Cleaning is a type of Acoustic cleaning, related to Ultrasonic cleaning. It is a gentler cleaning mechanism, less likely to cause damage, and is currently used in wafer cleaning.

Similar to Ultrasonic cleaning, megasonics utilizes a transducer, usually composed of Piezoelectric Crystals to create megasonic energy. Megasonic energy is of a higher frequency (800–2000Khz) than ultrasonic energy (<100Khz). As a result, the cavitation that occurs is gentler and on a much smaller scale. Megasonics are currently used mainly in the silicon industry.