Mask set

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A mask set is a series of electronic data that define geometry for the photolithography steps of semiconductor fabrication. Each of the physical masks generated from this data are called a photomask.

A mask set for a modern process typically contains as many as twenty or more masks, each of which defines a specific photolithographic step in the semiconductor fabrication process. Examples of masks include:

• p-well
• n-well
• active
• poly
• p-select
• n-select
• contact
• metal1, 2, 3...

For more information, see photolithography and semiconductor manufacturing.

[edit] References

* Saint, Christopher and Judy. (2002). IC Layout Basics. McGraw-Hill. ISBN 0-07-138625-4