Image:Ion implanter schematic.png

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Schematics of a mass separating implantation/deposition setup. Ions are accelerated with an applied high tension U_accell, mass separated in a magnetic field, pass through an apperture and are decelerated with a high tension U_decell. Ion energy at the substrate is determined by the difference of U_accell and U_decell. The deceleration step is optional (common in the case of deposition) and may be replaced by further acceleration steps to increase ion energy.

Image created by Daniel Schwen using Tgif.

Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. Subject to disclaimers.

Schematics of an mass separating implantation/deposition setup. Ion energy at the substrate is determined by the difference of U_accell and U_decell. Image created by User:Dschwen using Tgif.

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