Image:High-k.svg

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High-k.svg‎ (SVG file, nominally 401 × 235 pixels, file size: 8 KB)

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Description

Comparison of high-k dielectric structure with conventional silicon dioxide gate dielectric. Schematic is my graphical representation of an idea in the presentation by G. E. Moore, Intel Inc.
Source

en:Image:High-k.png
Date

2006-01-05, 2008-01-14
Author

en:User:Anoopm, traced by User:Stannered
Permission
(Reusing this image)

NOTE: "subject to disclaimers" below may not actually apply, this was tagged with {{GFDL-user-en}}, and after May 2007, w:en:Template:GFDL-self did not require disclaimers. Please check the image description page on the English Wikipedia (or, if it has been deleted, ask an English Wikipedia administrator). See Wikipedia:GFDL standardization for details.
Anoopm at the English language Wikipedia, the copyright holder of this work, has published or hereby publishes it under the following license:
GNU head Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts.

Subject to disclaimers.

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File history

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Date/TimeDimensionsUserComment
current18:14, 14 January 2008401×235 (8 KB)Stannered ({{Information |Description=Comparison of high-k dielectric structure with conventional silicon dioxide gate dielectric. Schematic is my graphical representation of an idea in the presentation by G. E. Moore, Intel Inc. |Source=en:Image:High-k.png |Da)
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