Image:DRIE Bosch process.png

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Description
English: Diagram of the Bosch process of w:Deep reactive-ion etching.
  1. Deposit and pattern masking layer (a).
  2. Etch
  3. Passivate
  4. Etch
  5. Structure after many etch steps
  6. After stripping passivation and mask. (b): Comb structure
Deutsch: Verfahrensschritte DRIE
  1. Auftragen und Strukturieren des Resist
  2. Ätzen
  3. Passivieren
  4. Ätzen
  5. Strukturtiefe erreicht
  6. Struktur nach dem Strippen von Resist und Passiverungssschicht. (b): Kammstruktur
Source

Modification of de:Bild:Verfahrensschritte-DRIE.png
Date

00:21, 9 January 2007 (UTC)
Author

Gurgelgonzo (original), Smack (talk) (modification)
Permission
(Reusing this image)

Public domain
Other versions de:Bild:Verfahrensschritte-DRIE.png

[edit] Licensing

Public domain I, the copyright holder of this work, hereby release it into the public domain. This applies worldwide.

In case this is not legally possible:
I grant anyone the right to use this work for any purpose, without any conditions, unless such conditions are required by law.

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Date/TimeDimensionsUserComment
current00:21, 9 January 2007172×637 (12 KB)Smack ({{Information |Description= {{en|Diagram of the Bosch process of w:Deep reactive-ion etching. # Structure before etching. (a): Masking layer # Etch # Passivate # Etch # Structure after many etch steps # After stripping passivation and mask}} |Source=)
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