180 nanometer

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CMOS manufacturing processes

10 µm 3 µm 1.5 µm 1 µm 800 nm (0.80 µm) 600 nm (0.60 µm) 350 nm (0.35 µm) 250 nm (0.25 µm) 180 nm (0.18 µm) 130 nm (0.13 µm) 90 nm 65 nm 45 nm 32 nm (Double Patterning) 22 nm (End of Planar Bulk CMOS) 16 nm (Transition to Nanoelectronics) 11 nm (Nanoelectronics)

The 180 nanometer (180 nm or 0.18 µm) process refers to the level of semiconductor process technology that was reached in the 1999-2000 timeframe, by most leading semiconductor companies, like Intel, Texas Instruments, IBM, and TSMC.

The origin of the 180 nm value is historical, as it reflects a trend of 70% scaling every 2-3 years. The naming is formally determined by the International Technology Roadmap for Semiconductors (ITRS) hosted by Sematech.

Some of the first CPUs manufactured with this process include Intel Coppermine family of Pentium III processors. This was the first technology using a wavelength shorter than that of light used for lithography (which has a minimum of 193 nm).

Preceded by 250 nm

CMOS manufacturing processes

Succeeded by 130 nm