Copyright on the content of patents
From Wikipedia, the free encyclopedia
 |
The examples and perspective in this article or section may not represent a worldwide view of the subject. Please improve this article or discuss the issue on the talk page. |
The copyright status of the content of patent applications and patents may vary from one legislation to another.
Contents |
[edit] Legislations
[edit] United States
In the United States, a patent applicant may obtain copyright protection or mask work protection for the content of their patent application if they include the following authorization notice in their application:[1]
- A portion of the disclosure of this patent document contains material which is subject to (copyright or mask work) protection. The (copyright or mask work) owner has no objection to the facsimile reproduction by anyone of the patent document or the patent disclosure, as it appears in the Patent and Trademark Office patent file or records, but otherwise reserves all (copyright or mask work) rights whatsoever.
Otherwise, however, "the text and drawings of a patent are typically not subject to copyright restrictions."[2]
[edit] European Patent Organisation
 |
This section is a stub. You can help by expanding it. |
[edit] Japan
|
This section is a stub. You can help by expanding it. |
[edit] World Intellectual Property Organization
|
This section is a stub. You can help by expanding it. |
[edit] Excerpting patents into Wikipedia articles
This article or section contains self-references.
When text from a US patent or patent application is excerpted into a Wikipedia article, the talk page of said article should contain the following notice {{Template:PD-US-patent}}
[edit] References
[edit] External links
- United States Patent and Trademark Office (USPTO) web site, Copyright and Trademark Issues RE: Materials from USPTO Website.
 |
This law-related article is a stub. You can help Wikipedia by expanding it. |
