350 nanometer

From Wikipedia, the free encyclopedia

CMOS manufacturing processes

10 µm 3 µm 1.5 µm 1 µm 800 nm (0.80 µm) 600 nm (0.60 µm) 350 nm (0.35 µm) 250 nm (0.25 µm) 180 nm (0.18 µm) 130 nm (0.13 µm) 90 nm 65 nm 45 nm 32 nm 22 nm 16 nm

The 350 nanometer (350 nm or 0.35 µm) process refers to the level of semiconductor process technology that was reached in the 1995-1996 timeframe, by most leading semiconductor companies, like Intel and IBM.

[edit] Products featuring 350 nm manufacturing process

• Intel Pentium Pro CPU launched in late 1995 was manufactured using this process.

Preceded by 600 nm

CMOS manufacturing processes

Succeeded by 250 nm