Qiangfei Xia
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Qiangfei Xia is the winner of the "Best Scanning Probe Micrograph" in the The 50th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Bizarre/Beautiful Micrograph Contest.(http://www.eipbn.org) The title of his winning entry is "Legends of the fall", which was renamed by the judges to "Stephen Chou's flower garden". He also won the third prize in the 2nd annual "Art of Science" competition at Princeton University. (http://www.princeton.edu/artofscience/gallery2006/index.html). The title of his art work is "Easter Bonnet".
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[edit] Academic and Research Info
Qiangfei Xia is currently attending Princeton University for his Ph.D. degree in Electrical Engineering. He is working in the NanoStructure Laboratory with Prof. Stephen Chou, the inventor of Nanoimprint Lithography, developing novel nanofabrication technologies and exploring applications of these emerging techniques in nanoscale electronic, optical, magnetic and biological devices. Before he came to Princeton University in 2001, he got his MS and BE degrees from China's Shanghai Jiao Tong University, both in materials science and engineering.
At Princeton University, most of his work is devoted to, or related with nanoimprint lithography. He has been focused mainly on laser assisted nanoimprint lithography, self-repair by liquefaction and its derivants. He also got nice results in fabrication of regular metal nanoparticle arrays, guided growth of carbon nanotubes and networks, and improving of photocurable nanoimprint lithography. More detailed description of his research can be found on his personal website.
[edit] Publications
(More will come when finished).
Q. Xia, Z. Yu, H. Gao and S.Y. Chou, "In situ real time monitoring of nanosecond imprint process", Appl. Phys. Lett. 89, 073107(2006).
Q. Xia and S.Y. Chou, "Ultrafast nanoimprint lithography", Proc. SPIE 5725, 180-187(2005). (Invited paper)
Q. Xia, C. Keimel, H. Ge, Z. Yu, W. Wu and S.Y. Chou, "Ultrafast patterning of nanostructures in polymers using laser assisted nanoimprint lithography", Appl. Phys. Lett. 83, 4417-4419 (2003). (Selected for the Virtual Journal of Nanoscale Science & Technology, and the Virtual Journal of Ultrafast Science).
A. A. Yasseri, S. Sharma, T. I. Kamins, Q. Xia, S.Y. Chou and R.F.W. Pease,"Alkylsiloxane self-assembled monolayer formation guided by nanoimprinted Si and SiO2 templates", Appl. Phys. Lett., 153121(2006).
X. Liang, W. Zhang, M. Li, Q. Xia, H. Ge, X. Huang, and S.Y. Chou, "Electrostatic force-assisted nanoimprint lithography (EFAN)", Nano Lett. 5, 527-530 (2005).
[edit] Conference Presentations
[edit] Major contribution
Q. Xia, K.J. Morton and S.Y. Chou, "Self-Sealed Sub-10-nm Nanofluidic Channel Arrays Patterned by Nanoimprint Lithography", The 5th International Conference on Nanoimprint and Nanoprint Technology (NNT'06), San Francisco, CA, Nov.15-17, 2006.
Q. Xia and S.Y. Chou, "Perfecting of Nanostructures in Hard Materials Using Guided Self-Repair by Liquefaction", The 50th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN'06), Baltimore, MD, May 30 – June 2, 2006.
Q. Xia and S.Y. Chou, "Perfecting of Nanoimprint Molds with Sub-25 nm Features Using Self-Repair by Liquefaction (SELF)", The 4th International Conference on Nanoimprint and Nanoprint Technology (NNT'05), Nara, Japan, Oct.19-21, 2005.
S.Y. Chou and Q. Xia, "Ultrafast Selective Self-repair of Nanostructures by Liquefaction", The 49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN'05), Grande Lakes,Orlando, FL, May 31-June 3, 2005.
Q. Xia and S.Y. Chou,"Ultrafast Nanoimprint Lithography", SPIE Photonics West 2005, San Jose, CA, Jan. 22-27, 2005. (invited talk)
Q. Xia, H. Zheng, C. Keimel, Z. Yu, S.Y. Chou, D. Ha, and T.J. King, "Laser Assisted Direct Imprint of SiGe and SiC", The 3rd International Conference on Nanoimprint and Nanoprint Technology (NNT'04), Vienna, Austria, Dec.1-3, 2004.
Q. Xia and S.Y. Chou, "Low-Cost, High-Throughput Fabrication of Metal Nanoparticle Monolayers Using Pulsed Laser Melting", The 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN'04), San Diego, CA, Jun.1-4, 2004.
H. Zheng, Q. Xia, C. Keimel, Z. Yu and S.Y. Chou, "Laser-Assisted Direct Imprint (LADI) of Nanostructures in Silicon Carbide", The 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN'04), San Diego, CA, Jun.1-4, 2004.
Q. Xia, C. Keimel, H. Ge, Z. Yu, W. Wu and S.Y. Chou, "Nanosecond Patterning of Nanostructures in Polymers Using Laser-Assisted Nano-Imprint Lithography (LA-NIL)", The 1st International Conference on Nanoimprint and Nanoprint Technology (NNT'02), San Francisco, CA, Dec.11-13, 2002.
[edit] Collaborations
F. Crnogorac, D. Witte, Q. Xia, S. Sharma, A. Yasseri, T. Kamins, S. Y. Chou, and R. F. W. Pease, "Crystallization of semiconductor islands on amorphous substrates", MRS 2006 Fall Meeting , Boston, MA, Nov.27-Dec.1, 2006.
F. Crnogorac, D. Witte, Q. Xia, Z. Liu, A. Mehta, S. Sharma, A. Yasseri, T. Kamins, S. Y. Chou, and R. F. W. Pease, "Nano-Graphoepitaxy of Semiconductors for 3D Integration", The 32nd International Conference on Micro- and Nano- Engineering (MNE'06), Barcelona, Spain, Sept. 17-20, 2006.
S. Bai, Q. Xia and S.Y. Chou, "Fabrication of Large Area Ordered Metallic Nano-Ring Array Using Nanoimprint Lithography", The 50th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN'06), Baltimore, MD, May 30 - June 2, 2006.
X. Liang, W. Zhang, M. Li, Q. Xia, H. Ge,X. Huang, and S.Y. Chou, "Advances in Electrostatic Force-Assisted Nanoimprint Lithography (EFAN)",The 3rd International Conference on Nanoimprint and Nanoprint Technology (NNT'04), Vienna, Austria, Dec.1-3, 2004.
X. Liang, W. Zhang, M. Li, Q. Xia, H. Ge, X. Huang and S.Y. Chou,"Electrostatic Force-Assisted Nanoimprint Lithography (EFAN)", The 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN'04), San Diego, CA, Jun.1-4, 2004.
W. Wu, H. Ge, M. Austin, X. Huang, M. Li, N. Li, H. Tan, X. Lei, Q. Xia, S. Bai, H. Gao and S.Y. Chou, "Photo-Curable Nanoimprint Lithography with Sub-5 nm Resolution, Sub-14 nm Pitch, and Sub-500 nm Alignment Using Spin-Coated Top Resist Layer and Single 4" Imprint Field", The 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN'04), San Diego, CA, Jun.1-4, 2004.
S. Bai, H. Ge, Q. Xia, X. Huang and S.Y. Chou,"Fabrication of High Aspect Ratio, 50 µm Deep Polymer Gratings with Smooth Sidewalls Using Nanoimprint Lithography", The 2nd International Conference on Nanoimprint and Nanoprint Technology (NNT'03), Boston, MA, Dec.3-5, 2003.
S.Y. Chou, W. Zhang, M. Li, H. Tan, W. Wu, Z. Yu, L. Chen, H. Ge, J. Wang, S. Schablitsky, C. Keimel, J. Gu, Q. Xia, L. Kong, B. Cui, L. Zhuang, P. Deshpande, X. Lei, L. Guo, M. Austin and H. Cao,"Nanoimprint Lithography Development at Princeton University", The 1st International Conference on Nanoimprint and Nanoprint Technology (NNT'02), San Francisco, CA, Dec.11-13, 2002.
